Electrical open/short contact alignment structure for active...

Details Electrical open/short contact alignment structure for active... Electrical open/short contact alignment structure for active...

2006-11-15

2010-02-09

He, Amy (Department: 2831)

Electricity: measuring and testing

Impedance, admittance or other quantities representative of...

Lumped type parameters

C324S765010, C257S048000, C438S014000

Reexamination Certificate

active

07659733

ABSTRACT:
An apparatus for measuring a structural characteristic between a polysilicon shape and a silicon area. The apparatus for measuring a structural characteristic between a polysilicon shape and a silicon area comprises the silicon area, and a plurality of polysilicon shapes each having a unique orientation relative to the silicon area wherein each of the polysilicon shapes is formed having an angle less than or equal to a critical angle. The critical angle is an angle at or below which a sidewall spacer no longer is formed on a polysilicon shape, thereby causing the polysilicon shape to short circuit to an underlying portion of the silicon area by way of a silicide bridge.

REFERENCES:
patent: 4983544 (1991-01-01), Lu et al.
patent: 5699282 (1997-12-01), Allen et al.
patent: 6268630 (2001-07-01), Schwank et al.
patent: 6461880 (2002-10-01), Tsiang
patent: 6468899 (2002-10-01), Choi
patent: 6593217 (2003-07-01), Fujisawa
patent: 6777759 (2004-08-01), Chau et al.

Affiliated with

Also associated with

Rating

Electrical open/short contact alignment structure for active... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrical open/short contact alignment structure for active..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrical open/short contact alignment structure for active... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4177000