Electrical device and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S401000

Reexamination Certificate

active

07446355

ABSTRACT:
A method of fabricating self-aligned recess utilizing asymmetric poly spacer is disclosed. A semiconductor substrate having thereon a first pad layer and second pad layer is provided. A plurality of trenches is embedded in a memory array region of the semiconductor substrate. Each of the trenches includes a trench top layer that extrudes from a main surface of the semiconductor substrate. Asymmetric poly spacer is formed on one side of the extruding trench top layer and is used, after oxidized, as a mask for forming a recess in close proximity to the trenches.

REFERENCES:
patent: 2002/0127798 (2002-09-01), Prall
patent: 2007/0096185 (2007-05-01), Kim et al.
patent: 2008/0009112 (2008-01-01), Lee et al.

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