Electrical defect monitor structure

Electricity: measuring and testing – Measuring – testing – or sensing electricity – per se – With rotor

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324 51, G01R 3126

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039834794

ABSTRACT:
A semiconductor defect monitoring structure employs a series of electrically testable serpentine stripe patterns having different widths and spacing in order to determine the distribution of the density of defects by size. Metal stripe patterns are superposed and rotated 90.degree. with respect to diffusion stripe patterns in a semiconductor wafer. A set of four field effect transistor devices are connected to each stripe pattern in such a way that tests may be made for all defects without interference between adjacent patterns. The defect monitoring structure helps to determine defects such as opens in diffusion and metallization, shorts in metallization, shorts in diffusion, pinholes in a thin oxide, and pinholes in a thick oxide.

REFERENCES:
ghatalia et al.; "Semiconductor Process Defect Monitor"; IBM Tech. Dis. Bull.; vol. 17; No. 9; Feb. 1975; pp. 2577-2578.

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