Electric arc vapor deposition apparatus and method

Details Electric arc vapor deposition apparatus and method Electric arc vapor deposition apparatus and method

1995-11-02

1997-08-12

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118723VE, 118726, 20429841, C23C 1400, C23C 1432

Patent

active

056560915

ABSTRACT:
A present invention relates to improvements in electric arc vapor deposition chambers. A first improvement involves the utilization of a heat shield disposed between a source and a substrate to decrease heat energy radiating from the source directly to the substrate. In a preferred embodiment, the heat shield is cooled by a liquid cooling system which acts to remove heat energy from the chamber. An improved source mounting assembly of the present invention provides for enhanced cooling of the source material. It includes the utilization of a back surface of the source material as a wall of a coolant chamber within the source mounting assembly. An O-ring seal is disposed at the rearward face of the source material to provide a cool temperature environment for the O-ring seal while it prevents coolant leakage into the chamber. An improved method for supplying electrical power for a substrate includes the utilization of a pulsed DC bias voltage which acts to improve the characteristics of a deposited film while avoiding unwanted overheating of the substrate.

REFERENCES:
patent: 898346 (1908-09-01), Ferranti
patent: 2378476 (1945-06-01), Guellich
patent: 3294669 (1966-12-01), Theuerer
patent: 3369989 (1968-02-01), Kay et al.
patent: 3604970 (1971-09-01), Culbertson et al.
patent: 3625848 (1971-12-01), Snaper
patent: 3678889 (1972-07-01), Murakami
patent: 3691053 (1972-09-01), James et al.
patent: 3709809 (1973-01-01), Wright et al.
patent: 3736175 (1973-05-01), Carleton
patent: 3783231 (1974-01-01), Sablev et al.
patent: 3793179 (1974-02-01), Sablev et al.
patent: 4094764 (1978-06-01), Boucher et al.
patent: 4197175 (1980-04-01), Moll et al.
patent: 4222838 (1980-09-01), Bhagat et al.
patent: 4333962 (1982-06-01), Pulker
patent: 4361114 (1982-11-01), Gurev
patent: 4410407 (1983-10-01), Macaulay
patent: 4448799 (1984-05-01), Bergman et al.
patent: 4466872 (1984-08-01), Einbinder
patent: 4511593 (1985-04-01), Brandolf
patent: 4511594 (1985-04-01), Yanai
patent: 4556471 (1985-12-01), Bergman
patent: 4622452 (1986-11-01), Bergman et al.
patent: 4681773 (1987-07-01), Bean
patent: 4724058 (1988-02-01), Morrison
patent: 4801839 (1989-01-01), Collins
patent: 4828872 (1989-05-01), Bauer
patent: 4856457 (1989-08-01), Knauer
patent: 4959242 (1990-09-01), Itoh
patent: 5100526 (1992-03-01), Ito

Affiliated with

Also associated with

Rating

Electric arc vapor deposition apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electric arc vapor deposition apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electric arc vapor deposition apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-156844