Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier
Reexamination Certificate
2007-05-08
2007-05-08
Caldarola, Glenn (Department: 1764)
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Waste gas purifier
C422S168000
Reexamination Certificate
active
09970613
ABSTRACT:
An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.
REFERENCES:
patent: 3898040 (1975-08-01), Tabak
patent: 3949057 (1976-04-01), Gilbert, Jr.
patent: 4011298 (1977-03-01), Fukui et al.
patent: 4083607 (1978-04-01), Mott
patent: 4172708 (1979-10-01), Wu et al.
patent: 4236464 (1980-12-01), Anderson et al.
patent: 4296079 (1981-10-01), Hauser
patent: 4479809 (1984-10-01), Johnson et al.
patent: 4519999 (1985-05-01), Coleman
patent: 4584001 (1986-04-01), Dechene
patent: 4661056 (1987-04-01), Vickery et al.
patent: 4719088 (1988-01-01), Itoh et al.
patent: 4801437 (1989-01-01), Konagaya et al.
patent: 4886444 (1989-12-01), Hirase et al.
patent: 4908191 (1990-03-01), Boldish et al.
patent: 4935212 (1990-06-01), Jacob
patent: 4986838 (1991-01-01), Johnsgard
patent: 5009869 (1991-04-01), Weinberg et al.
patent: 5113789 (1992-05-01), Kamian
patent: 5118286 (1992-06-01), Sarin
patent: 5123836 (1992-06-01), Yoneda et al.
patent: 5147421 (1992-09-01), Yung
patent: 5160707 (1992-11-01), Murray et al.
patent: 5183646 (1993-02-01), Anderson et al.
patent: 5206003 (1993-04-01), Imoto et al.
patent: 5213767 (1993-05-01), Smith et al.
patent: 5238656 (1993-08-01), Tajima et al.
patent: 5252007 (1993-10-01), Klinzing
patent: 5271908 (1993-12-01), Shiban et al.
patent: 5281302 (1994-01-01), Gabric et al.
patent: 5292704 (1994-03-01), Lester
patent: 5364604 (1994-11-01), Spink et al.
patent: 5393394 (1995-02-01), Ikeda et al.
patent: 5407647 (1995-04-01), Tarancon
patent: 5510093 (1996-04-01), Bartz et al.
patent: 5533890 (1996-07-01), Holst et al.
patent: 5575636 (1996-11-01), Kobayashi et al.
patent: 5599508 (1997-02-01), Martinelli
patent: 5601790 (1997-02-01), Stilger et al.
patent: 5603905 (1997-02-01), Bartz et al.
patent: 5649985 (1997-07-01), Imamura
patent: 5665317 (1997-09-01), Laslo
patent: 5693293 (1997-12-01), Reichardt et al.
patent: 5716428 (1998-02-01), Imamura
patent: 5756052 (1998-05-01), Suzumura
patent: 5759498 (1998-06-01), Sheu et al.
patent: 5800792 (1998-09-01), Ibaraki et al.
patent: 5877391 (1999-03-01), Kanno et al.
patent: 5891404 (1999-04-01), Ibaraki et al.
patent: 5914091 (1999-06-01), Holst et al.
patent: 5955037 (1999-09-01), Holst et al.
patent: 6322756 (2001-11-01), Arno et al.
patent: 0360941 (1990-04-01), None
patent: 0861683 (1998-09-01), None
patent: 0885648 (1998-12-01), None
patent: 57-117333 (1982-07-01), None
patent: 59082927 (1984-05-01), None
patent: 61-200851 (1986-09-01), None
patent: 63-062528 (1988-03-01), None
patent: 03-65218 (1991-03-01), None
patent: 04-209524 (1992-10-01), None
patent: 05-192534 (1993-08-01), None
patent: 05-296979 (1993-11-01), None
patent: 06-063357 (1994-03-01), None
patent: 07-10335 (1995-02-01), None
patent: 07-323211 (1995-12-01), None
patent: 08-309146 (1996-11-01), None
patent: WO 96/16720 (1996-06-01), None
patent: WO 98/29181 (1998-07-01), None
patent: WO 99/02921 (1999-01-01), None
US 5,620,653, 04/1997, Jain et al. (withdrawn)
Langan, John, et al., “Strategies for Greenhouse Gas Reduction”, Jul. 1996, Solid State Technology, pp. 115-116, 118, 120, and 122.
Holmes, John T., et al., “Fluidized Bed Disposal of Fluorine”, Oct. 1967, I & EC Process Design and Development, vol. 6, No. 4, pp. 408-413.
Cady, George Hamilton, “Reaction of Fluorine with Water and with Hydroxides”, Feb. 1935, J. Am. Chem. Soc., vol. 57, pp. 246-249.
Smiley, S.H., et al., “Continuous Disposal of Fluorine”, May 27, 1953, Industrial and Engineering Chemistry, vol. 46, No. 2, pp. 244-247.
Streng, A.G., “The Fluorine-Steam Flame and Its Characteristics”, Jun. 1962, Combustion Flame, vol. 6, pp. 89-91.
Hardwick, Steven J., et al., “Waste Minimization in Semiconductor Processing”, 1994, Mater. Res. Soc. Symp. Proc., vol. 344, pp. 273-278.
Hayakawa, Saburo, “Silane Gas Scrubber”, Koatsu Gasu, 24(7), p. 371-9, (1987).
“Catalytic Decomposition System”, Hitachi America, Ltd. Semiconductor Equipment Group-SCDS Gas Abatement Systems, <http://www.hitachi.com/semiequipment/products scds.html>, pp. 1-2, printed on Apr. 21, 1999.
“Kanken Techno detoxifier KT 1000 Venus”, Crystec Technology Trading GmbH, <http://www.crystec.com/ktcvenue.htm>>, pp. 1-4, printed on Jul. 27, 1999.
Abrea, et al., Causes of anomalous solid formation in the exhaust system of low-pressure chemical vapor depostion plasma enhanced chemcial vapor deposition semiconductor processes, J. Vac. Sci. Technol B 12(4) Jul./Aug. 1994, pp. 2763/2767.
SoPheTec® International Product Spec Sheet, Model C-500 Physical Water Conditioner A publication by SohTec International, Costa Mesa, California.
Klaus J. Kronenberg, “Magnetized”, Aqua Magazine, Aug. 1993, pp. 20-24.
Klaus J. Kronenberg, “Magnetized II”, Aqua Magazine, Sep. 1993, pp. 20-23.
SoPheTec® International Product Spec Sheet, Model I-1020 Physical Water Conditioning A publication by SohTec International, Costa Mesa, California.
SoPheTec® Science-Marketing-Technology, Two Year Anniversary Special Edition, A publication by SohTec International, Costa Mesa, California, pp. 1-6.
Arya Prakash V.
Carpenter Kent
Holst Mark
Lane Scott
Applied Materials Inc.
Caldarola Glenn
Dugan & Dugan P.C.
Duong Tom
LandOfFree
Effluent gas stream treatment system having utility for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Effluent gas stream treatment system having utility for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Effluent gas stream treatment system having utility for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3807273