Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having substrate registration feature
Reexamination Certificate
2010-02-10
2011-10-25
Parker, Kenneth (Department: 2815)
Semiconductor device manufacturing: process
Formation of electrically isolated lateral semiconductive...
Having substrate registration feature
C438S462000, C257S797000, C257SE23179
Reexamination Certificate
active
08043928
ABSTRACT:
A semiconductor wafer includes multi chip areas each including two or more device chip areas and arranged in an X-axis direction and a Y-axis direction, a plurality of scribe lines formed parallel to the X axis and the Y axis such as to separate the device chip areas from each other, and one or more alignment marks formed in each of the multi chip areas on the scribe lines between adjacent ones of the device chip areas included in one multi chip area, the one or more alignment marks being fewer than the device chip areas in each of the multi chip areas and used for positioning of the semiconductor wafer.
REFERENCES:
patent: 6329700 (2001-12-01), Ishimura et al.
patent: 62-54432 (1987-03-01), None
patent: 8-123011 (1996-05-01), None
patent: 2652015 (1997-05-01), None
patent: 2001-35924 (2001-02-01), None
patent: 2002-237446 (2002-08-01), None
patent: 2005-44838 (2005-02-01), None
Cooper & Dunham LLP
Diaz José R
Parker Kenneth
Ricoh & Company, Ltd.
LandOfFree
Efficient provision of alignment marks on semiconductor wafer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Efficient provision of alignment marks on semiconductor wafer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Efficient provision of alignment marks on semiconductor wafer will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4281290