Effective near neutral pH etching solution for molybdenum or tun

Details Effective near neutral pH etching solution for molybdenum or tun Effective near neutral pH etching solution for molybdenum or tun

1990-04-30

1991-02-26

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156656, 156664, 252 791, 252 792, 252 795, B44C 122, C23F 100, C09K 1300

Patent

active

049959425

ABSTRACT:
A neutral or near neutral pH etching solution for effectively etching molybdenum and tungsten including: an aqueous ferricyanide ion solution, a soluble molybdate or tungstate, and an essential compound such that upon combination of said soluble molybdate or tungstate and said essential compound, a heteropoly compound is formed in which said essential compound contributes at least one heteroatom to said heteropoly compound.
The etching solution is most preferably used for etching molybdenum or tungsten which is adhered or proximate to a base-sensitive material.

REFERENCES:
patent: 4747907 (1988-05-01), Acocelia et al.
L. D. David, et al., "Ozone Reoxidation of a Ferrieyanide Bath for Etching Molybdenum" Metal FInishing, pp. 47-49 (May 1988).
Tsigdinos, "Heteropoly Compounds of Tungsten and Molybdenum" Topics in Current Chemistry, 76 (Springer-Verlay, 1978).

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