Effective assist pattern for nested and isolated contacts

Details Effective assist pattern for nested and isolated contacts Effective assist pattern for nested and isolated contacts

2006-07-11

2006-07-11

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07074528

ABSTRACT:
A photomask with desired illumination conditions can be constructed by combining a base pattern of openings with an assist pattern which includes openings that are offset from respectively corresponding openings of the base pattern by a preset angular distance.

REFERENCES:
patent: 6852453 (2005-02-01), Wu
patent: 2003/0198872 (2003-10-01), Yamazoe et al.

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