EEPROM structure with improved data retention utilizing...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S316000, C257SE29300

Reexamination Certificate

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07425741

ABSTRACT:
A biased conductive plate is provided over an NVM cell structure to overcome data retention charge loss due to the presence of dielectric films that are conductive at higher temperatures. The biased conductive plate is preferably formed from the lowest metal layer in the fabrication process flow, but any biased conductive layer can be used.

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patent: 5086410 (1992-02-01), Bergemont et al.
patent: 5614748 (1997-03-01), Nakajima et al.
patent: 6137723 (2000-10-01), Bergemont et al.
patent: 6597036 (2003-07-01), Lee et al.
patent: 2003/0043630 (2003-03-01), Forbes et al.

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