EEPROM cell with improved tunneling properties

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257607, H01L 2978

Patent

active

053713931

ABSTRACT:
The present invention is directed to a semiconductor memory device and a method for fabricating a semiconductor memory device, in particular a E.sup.2 PROM, having an improved tunnel area wherein electrons travel to and from a floating gate. The tunnel area is characterized by properties which lend to a relatively large number of programming and erasure cycles over the life of the E.sup.2 PROM. The tunnel area includes a tunneling gate which is fabricated via two implant stages. Because these two stages are separate from one another, each of the implant stages can be independently optimized to improve the properties of the tunnel area. Further, the windows used to define the implant regions are easily fabricated and are designed to facilitate formation of the implant regions. The method of defining the window lends to easy scaling of the process for advancing generations of technology.

REFERENCES:
patent: 4477883 (1984-10-01), Wada
patent: 4519849 (1985-05-01), Korsh et al.
patent: 4520553 (1985-06-01), Kraft
patent: 4642881 (1987-02-01), Matsukawa et al.
patent: 4780424 (1988-10-01), Holler et al.
patent: 4851361 (1989-07-01), Schumann et al.
patent: 5100819 (1992-03-01), Gill et al.
"Comparison And Trends In Today's Dominant E.sup.2 Technologies", by S. K. Lai et al, IEEE, dated 1986, pp. 580-583.
International Search Report dated Dec. 28, 1992.
"A Million Cycle CMOS 256K Bit EPROM", IEEE Journal of Solid State Circuits, by D. Cioaco et al, vol. SC-22, No. 5, Oct. 1987, pp. 684-692.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

EEPROM cell with improved tunneling properties does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with EEPROM cell with improved tunneling properties, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and EEPROM cell with improved tunneling properties will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-216721

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.