Edge roughness measurement in optical metrology

Details Edge roughness measurement in optical metrology Edge roughness measurement in optical metrology

2006-05-16

2006-05-16

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Surface roughness

C250S559220

Reexamination Certificate

active

07046375

ABSTRACT:
Edge roughness and deterministic profile of a structure formed on a semiconductor wafer are measured using optical metrology by directing an incident beam on the structure using a source and receiving the diffracted beam from the structure using a detector. The received diffracted beam is processed using a processor to determine a deterministic profile of the structure and to measure an edge roughness of the structure.

REFERENCES:
patent: 4408884 (1983-10-01), Kleinknecht et al.
patent: 5002631 (1991-03-01), Giapis et al.
patent: 6256100 (2001-07-01), Banet et al.
patent: 2002/0018217 (2002-02-01), Weber-Grabau et al.
I.B.M Technical Disclosure Bulletin, Optical Determination of Semiconductor Device Edge Profiles, Jul. 1, 1976, p. Nos. 474-477 (Document No. NN7607474).

Affiliated with

Also associated with

Rating

Edge roughness measurement in optical metrology does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Edge roughness measurement in optical metrology, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Edge roughness measurement in optical metrology will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3586636