Edge bead removal inspection by reflectometry

Details Edge bead removal inspection by reflectometry Edge bead removal inspection by reflectometry

2008-01-29

2008-01-29

Nguyen, Tu T (Department: 2886)

Optics: measuring and testing

By polarized light examination

Of surface reflection

Reexamination Certificate

active

11527135

ABSTRACT:
A method and apparatus for enhancing image contrast between resist-covered and bare silicon regions of a wafer, applicable to Edge Bead Removal inspection. The wafer is illuminated separately by s-polarized light and p-polarized light impinging at near the Brewster angle of silicon or resist, and an image difference between the reflected s-polarized light and the reflected p-polarized light is derived.

REFERENCES:
patent: 7142300 (2006-11-01), Rosengaus

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