Edge and bevel cleaning process and system

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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C438S687000, C438S694000

Reexamination Certificate

active

07122473

ABSTRACT:
The present invention provides at least one nozzle that sprays a rotating workpiece with an etchant at an edge thereof. The at least one nozzle is located in an upper chamber of a vertically configured processing subsystem that also includes mechanisms for plating, cleaning and drying in upper and lower chambers.

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patent: 6132587 (2000-10-01), Jorne et al.
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patent: 6352623 (2002-03-01), Volodarsky et al.
patent: 6494219 (2002-12-01), Nayak et al.
patent: 6833063 (2004-12-01), Basol
patent: 2001/0052159 (2001-12-01), Moinpour et al.

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