Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1999-04-06
2000-11-28
Shingleton, Michael B
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511151, 118723I, 118723AN, H01J 724, H05B 3126
Patent
active
061539775
ABSTRACT:
In a plasma generating apparatus utilizing electron cyclotron resonance, comprising a vacuum vessel capable of maintaining a vacuum state therein, an antenna for radiating electromagnetic waves into the vacuum vessel, a permanent magnet for forming a resonance magnetic field, and an outer sleeve made of an insulator and accommodating the permanent magnet therein, the outer sleeve being permeable to lines of magnetic force and having air tightness, two permanent magnets are arranged to form the resonance magnetic field in a spaced relation with the same polarity poles of the permanent magnets facing each other. With this ECR type plasma generating apparatus, a resonance region is increased so that various plasma processes can be uniformly performed over a wider region.
REFERENCES:
patent: 5173640 (1992-12-01), Geisler et al.
Taira Tetsusaburo
Takano Yasusaburou
Shingleton Michael B
Tokyo Seihinkaihatsu Kenkyusho
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