Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Quality evaluation
Reexamination Certificate
2006-01-17
2006-01-17
Barlow, John (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Quality evaluation
Reexamination Certificate
active
06988045
ABSTRACT:
The present invention is generally directed to various methods and systems for adaptive metrology sampling plans that may be employed to monitor various manufacturing processes. In one example, the method includes creating a plurality of metrology sampling rules, assigning each of the metrology sampling rules a sampling weight value, identifying at least one workpiece that satisfies at least one of the metrology sampling rules, assigning the sampling weight value for each of the satisfied metrology sampling rules with the identified workpieces that satisfy the rules, and indicating a metrology operation should be performed when a cumulative total of the sampling weight values is at least equal to a pre-established trigger value.
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Williams et al., “Optimized Sample Planning for Wafer Defect Inspection,” IEEE, pp. 43-46, 1999.
Advanced Micro Devices , Inc.
Barlow John
Khuu Cindy D.
Williams Morgan & Amerson P.C.
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