Dynamic fluid control system for immersion lithography

Details Dynamic fluid control system for immersion lithography Dynamic fluid control system for immersion lithography

2005-05-18

2008-09-16

Kim, Peter B (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

07426014

ABSTRACT:
A dynamic fluid control system and method capable of reducing dynamic forces from the fluid on the last optical element (20) and substrate stage (14) caused by the motion of the immersion fluid. The system includes an imaging element (12) that defines an image and a stage (14) configured to support a substrate (16). An optical system (18) is provided to project the image defined by the imaging element onto the substrate. The optical system (18) includes a last optical element (20). A gap (22) filled with immersion fluid is provided between the substrate (16) and the last optical element (20). A dynamic force control system (34) is provided to maintain a substantially constant force on the last optical element and the stage (14) by compensating for dynamic changes of the immersion fluid caused by the motion of the immersion fluid through the gap and/or movement of the stage.

REFERENCES:
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5523193 (1996-06-01), Nelson
patent: 2002/0020821 (2002-02-01), Van Santen et al.
patent: 2003/0010096 (2003-01-01), Long
patent: 2004/0114117 (2004-06-01), Bleeker
patent: 2005/0007569 (2005-01-01), Streefkerk et al.
patent: 2005/0018156 (2005-01-01), Mulkens et al.
patent: 2005/0030498 (2005-02-01), Mulkens
patent: 2005/0174550 (2005-08-01), Streefkerk et al.
patent: 2005/0178195 (2005-08-01), Pinter et al.
patent: 2005/0219481 (2005-10-01), Cox et al.
patent: 2005/0259233 (2005-11-01), Streefkerk et al.
patent: 2005/0259234 (2005-11-01), Hirukawa et al.
patent: 2005/0270506 (2005-12-01), Streefkerk et al.
patent: 2006/0097193 (2006-05-01), Horsky et al.
patent: 2006/0114445 (2006-06-01), Ebihara
patent: 2006/0126045 (2006-06-01), Ono et al.
patent: 2006/0139613 (2006-06-01), Houkes et al.
patent: 2006/0209278 (2006-09-01), Kiuchi et al.
patent: 2007/0081136 (2007-04-01), Hara
patent: 1 703 548 (2006-09-01), None
patent: A-59-19912 (1984-02-01), None
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None
patent: WO 2004/053955 (2004-06-01), None
patent: WO 2004/090634 (2004-10-01), None
patent: WO 2004/114380 (2004-12-01), None
patent: WO 2005/006416 (2005-01-01), None
patent: WO 2005/006417 (2005-01-01), None
patent: WO 2005/024517 (2005-03-01), None
patent: WO 2005/067013 (2005-07-01), None
patent: WO 2005/093791 (2005-10-01), None

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