Dyed photoresists and methods and articles of manufacture...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S905000, C430S910000, C430S926000

Reexamination Certificate

active

07147983

ABSTRACT:
The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.

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Paul et al., “An anthracene-containing PMMA derivative for photoresist and channel waveguide applications”,Thin Solid Films; vol. 288 (1996) pp. 150-154.

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