Dual stage instrument for scanning a specimen

Measuring and testing – Surface and cutting edge testing – Roughness

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07100430

ABSTRACT:
A dual stage scanning instrument includes a sensor for sensing a parameter of a sample and coarse and fine stages for causing relative motion between the sensor and the sample. The coarse stage has a resolution of about 1 micrometer and the fine stage has a resolution of 1 nanometer or better. The sensor is used to sense the parameter when both stages cause relative motion between the sensor assembly and the sample. The sensor may be used to sense height variations of the sample surface as well as thermal variations, electrostatic, magnetic, light reflectivity or light transmission parameters at the same time when height variation is sensed. By performing along scan at a coarser resolution and short scans a high resolution using the same probe tip or two probe tips at fixed relative positions, data obtained from the long and short scans can be correlated accurately.

REFERENCES:
patent: 2691887 (1954-10-01), Rinker
patent: 2728222 (1955-12-01), Becker et al.
patent: 3283568 (1966-11-01), Reason
patent: 4103542 (1978-08-01), Wheeler et al.
patent: 4391044 (1983-07-01), Wheeler
patent: 4441177 (1984-04-01), Groh et al.
patent: 4574625 (1986-03-01), Olasz et al.
patent: 4641773 (1987-02-01), Morino et al.
patent: 4669300 (1987-06-01), Hall et al.
patent: 4724318 (1988-02-01), Binnig
patent: 4883959 (1989-11-01), Hosoki et al.
patent: 4902892 (1990-02-01), Okayama et al.
patent: RE33387 (1990-10-01), Binnig
patent: 5047633 (1991-09-01), Finlan et al.
patent: 5146690 (1992-09-01), Breitmeier
patent: 5162653 (1992-11-01), Hosaka et al.
patent: RE34331 (1993-08-01), Elings et al.
patent: 5245187 (1993-09-01), Kawase et al.
patent: 5253106 (1993-10-01), Hazard
patent: 5266801 (1993-11-01), Elings et al.
patent: 5276672 (1994-01-01), Miyazaki et al.
patent: 5298975 (1994-03-01), Khoury et al.
patent: 5307693 (1994-05-01), Griffith et al.
patent: 5308974 (1994-05-01), Elings et al.
patent: 5309755 (1994-05-01), Wheeler
patent: 5319977 (1994-06-01), Quate et al.
patent: 5347854 (1994-09-01), Martin et al.
patent: 5391871 (1995-02-01), Matsuda et al.
patent: 5406832 (1995-04-01), Gamble et al.
patent: 5412980 (1995-05-01), Elings et al.
patent: 5414690 (1995-05-01), Shido et al.
patent: 5415027 (1995-05-01), Elings et al.
patent: 5426302 (1995-06-01), Marchman et al.
patent: 5461907 (1995-10-01), Tench et al.
patent: 5481521 (1996-01-01), Washizawa et al.
patent: 5488862 (1996-02-01), Neukermans et al.
patent: 5497656 (1996-03-01), Kado et al.
patent: 5509300 (1996-04-01), Chamberlin et al.
patent: 5513168 (1996-04-01), Fujihara et al.
patent: 5614712 (1997-03-01), Ray
patent: 5621210 (1997-04-01), Lindsay
patent: 5627365 (1997-05-01), Chiba et al.
patent: 5629790 (1997-05-01), Neukermans et al.
patent: 5705741 (1998-01-01), Eaton et al.
patent: 5866806 (1999-02-01), Samsavar et al.
patent: 5948972 (1999-09-01), Samsavar et al.
patent: 6028305 (2000-02-01), Minne et al.
patent: 6267005 (2001-07-01), Samsavar et al.
patent: 6267972 (2001-07-01), Breton et al.
patent: 0361932 (1989-09-01), None
patent: 0536827 (1992-09-01), None
patent: 0594362 (1993-10-01), None
patent: 0 694 362 (1994-04-01), None
patent: 0633450 (1994-06-01), None
patent: 2009409 (1979-06-01), None
patent: 2249910 (1990-10-01), None
patent: WO 88/04047 (1988-06-01), None
patent: WO 94/08204 (1994-04-01), None
patent: WO 94/25888 (1994-11-01), None
patent: WO 98/05920 (1998-02-01), None
Griffith, J. E. et al., “Dimensional Metrology with Scanning Probe Microscopes”, J. Appl. Phys. vol. 74, No. 9, Nov. 1, 1993, pp. R83-R109.
“Dimensional Metrology of Phase-Shifting Masks with Scanning Probe Microscopes,” J.E. Griffith et al., SPIE, vol. 2087, 1993, pp. 107-118.
“Silicon Wafer Thermal Processing: 300 mm Issues,” H. Huff et al., Future Fab International, 1996, pp. 35-49.
“Atomic force microscopy for high speed imaging using cantilevers with an integrated actuator and sensor,” S.R. Manalis et la., Appl. Phys. Lett., 68(6), Feb. 5, 1996, pp. 871-873.
“Single-Tube Three-Dimensional Scanner for Scanning Tunneling Microscopy,” G. Binnig et al., Review of Scientific Instruments, vol. 57, No. 8, Aug. 1986, pp. 1688-1689.
“Magnetic Force Microscopy (MFM),” P. Grutter et al., Springer Series in Surface Sciences, Scanning Tunneling Microscopy II, vol. 28, Springer-Verlag Berlin Heidelberg 1992, pp. 152-207.
“Thermal Imaging of Electronic Materials and Devices Using the Atomnic Force Microscope,” A. Majumdar et al., Proceedings of the SPIE-The International Society of Optical Engineering, 1993, Abstract Only.
“A Stand-Alone Scanning Force and Friction Microscopy,” M. Hipp et al., Ultramicroscopy, 42-44 (1992), Elsevier Science Publishers B.V., pp. 1498-1503.
“New Scanning Device for Scanning Tunneling Microscope Applications,” R. Koops et al., Review of Scientific Instruments, vol. 63, No. 8, Aug. 1992, pp. 4008-4009.
“Scanning Tunneling Microscopy,” G. Binnig et al., Helvetica Physica Acts, vol. 55, 1982, pp. 726-735.
“Two-Scanning Tunneling Microscope Device for Large Samples,” G.B. Picotto et al., Review of Scientific Instruments, vol. 64, No. 9, Sep. 1993, pp. 2699-2701.
“A High Precision Micropositioner Based on Magnetostruction Principle,” W. Wang et al., Review of Scientific Instruments, vol. 63, No. 1, Jan. 1992, pp. 249-254.
“Design and Assessment of Monolithic High Precision Translation Mechanisms,” S.T. Smith et al., Journal of Physics E: Scientific Instruments, vol. 20, Aug. 1987, pp. 977-983.
“Novel Optical Approach to Atomic Force Microscopy,” G. Meyer et al., Applied Physics Letters, vol. 53, No. 12, Sep. 1988, pp. 1045-1047.
“Long Range Constant Force Profiling for Measurement of Engineering Surfaces,” L.P. Howard, Review of Scientific Instruments, vol. 63, No. 10, Oct. 1992, pp. 4289-4295.
“The National Institute of Standard and Technology Molecular Measuring Machine Project: Metrology and Precision Engineering Design,” E.C. Teague, J. Vac. Sci. Technol. B, vol. 7, No. 6, Nov./Dec. 1989, pp. 1898-1902.
“Evaluating the Sensitivity of a Fiber-Optic Displacement Sensor,” W.C. Oliver, Nano Instruments, Inc., Technotes.
“To Measure a Molecule,” F. Flam, pp. 21-24.
“The National Institute of Standards and Technology Molecular Measuring Machine: A Long-Range Scanning Tunneling Microscope for Dimensional Metrology,” E.C. Teague, Microbeam Analysis, 1989, pp. 545-547.
“Products for Micropositioning,” Product Information Brochure published by Physik Instruments (PI) GmbH & Co.
“Fiber Optic Proximity Sensors,” Product Information Brochure published by Phone-Or, Ltd., Fiber Optic Sensors of Ashkelon Israel.
“Series 88 Fiber-Optic Displacement Sensors,” G.J. Philips, Sensors, Feb. 1995.
“Nanometrology,” E.C. Teague, Proceedings of Scanned Probe Microscopy: STM and Beyond, an Engineering Foundation Conference, Santa Barbara, CA, Jan. 1991.
“A New Force Sensor Incorporating Force-Feedback Control for Intrafacial Force Microscopy,” S. Joyce et al., Rev. Sci. Instrum., vol. 62, No. 3, Mar. 1991, pp. 710-715.
“From Molecules to Cells: Imaging Soft Samples with the Atomic Force Microscope,” M. Radmacher et al., Science, vol. 257, Sep. 25, 1992, pp. 1900-1905.
“Resonant silicon sensors,” Goran Stemme, J. Micromech. Microeng., 1 (1991), pp. 113-126.
“A rocking beam electrostatic balance for the measurement of small forces,” G.L. Miller et al., Rev. Sci. Instrum., vol. 62, No. 3, Mar. 1991, pp. 705-709.
“Scanning force microscope springs optimized for optical beam deflection and with tips made by controlled fracture,” M.G.L. Gustafsson et al., J. Appl. Phys., 76(1), Jul. 1, 1994, pp. 172-181.
“Force Microscopy Using Common-Path Optical-Heterodyne Interferometer,” H. Kikuta et al., JJAP, Part 1, vol. 30, No. 3, Mar. 1991, pp. 587-590.
&#x

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dual stage instrument for scanning a specimen does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dual stage instrument for scanning a specimen, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual stage instrument for scanning a specimen will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3560985

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.