Dual mode gas field ion source

Details Dual mode gas field ion source Dual mode gas field ion source

2011-06-28

2011-06-28

Berman, Jack I (Department: 2881)

Radiant energy

Ion generation

Field ionization type

C250S3960ML

Reexamination Certificate

active

07968855

ABSTRACT:
A focused ion beam device is described. The focused ion beam device includes an ion beam column including an enclosure for housing a gas field ion source emitter with an emitter area for generating ions, an electrode for extracting ions from the gas field ion source emitter, one or more gas inlets adapted to introduce a first gas and a second gas to the emitter area, an objective lens for focusing the ion beam generated from the first gas or the second gas, a voltage supply for providing a voltage between the electrode and the gas field ion source emitter, and a controller for switching between a first voltage and a second voltage of the voltage supply for generating an ion beam of ions of the first gas or an ion beam of ions of the second gas.

REFERENCES:
patent: 7554097 (2009-06-01), Ward et al.
patent: 7589328 (2009-09-01), Frosien et al.
Edinger, et. al. “Development of a High Brightness Gas Field Ion Source”, Journal of Vacuum Science and Technology B: Microelectronics Processing and Phenomena, vol. 15(6) Nov. 1, 1997, pp. 120-124, American Vacuum Society, New York NY.
Ochiai, et. al. “Flourine Field Ion Source Using Flourine-Helium Gas Mixture”, Journal of Vacuum Science & Technology A 9 Jan./Feb. 1991 No. 1, p. 51-56.
Extended European Search Report for European Application No. 08101447.4-2208 dated Jul. 16, 2008.
K. Edinger, et al.; “Development of a high brightness gas field ion source”; Journal of Vacuum Science and Technology B:Microelectronics processing and phenomena; vol. 15(6); Nov. 1, 1997; pp. 120-124 American Vacuum Society; New York, NY.
CH. Wilbertz, et al.; “A focused gas-ion beam system for submicron application”; Nuclear Instruments and Methods in Physics Research, Section-B: Beam Interactions with Materials and Atoms, Elsevier; Jan. 1, 1992; pp. 120-124 vol. B63, No. 1/02; Amsterdam, NL.
R. Borret, et al.; “Current-voltage characteristics of a gas field ion source with a supertip”; Journal of Physics D: Applied Physics;Oct. 14, 1990; pp. 1271-1277; vol. 23 No. 10; IOP Publishing Ltd.; Bristol, GB.
CH. Wilbertz, et al.; “Recent progress in Gas Field Ion Source technology”; Proceedings of the Spie; Jan. 1, 1994; pp. 407-417; vol. 2194; Bellingham, VA.
A. Knoblauch, et al.; “Electron and ion emission properties of iridium supertip field emitters”; Nuclear Instruments and Methods in Physics Research B: Beam Interactions with Materials and Atoms, Elsevier; Apr. 1, 1998; pp. 20-27; vol. 139 Nos. 1-4;Amsterdam, NL.
Y. Ochiai, et al.; “Flourine field ion source using flourine-helium gas mixture”; Journal of Vacuum Science and Technology: Part A, AVS/AIP; Jan. 1, 1991; pp. 51-56; vol. 9, No. 1; Melville, NY.

Affiliated with

Also associated with

Rating

Dual mode gas field ion source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dual mode gas field ion source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual mode gas field ion source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2732591