Dual mask capacitor for integrated circuits

Electricity: electrical systems and devices – Electrostatic capacitors – Fixed capacitor

Reexamination Certificate

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Details

C361S321100, C361S321400, C361S301400, C361S320000, C361S311000

Reexamination Certificate

active

06898068

ABSTRACT:
An embodiment of the invention is a capacitor comprising a bottom electrode70coupled to a first interconnect30aof the top metal level10, a capacitor dielectric90, sidewalls105, and a top electrode110coupled to a second interconnect30bof the top metal level10. Another embodiment of the invention is a method of manufacturing a capacitor using a first mask140to form a material stack that includes a bottom electrodes70coupled to a first interconnect30aof the top metal level10, a capacitor dielectric90, and a partial top electrode100. The method further includes using a second mask150to form a complete top electrode coupled to a second interconnect30bof the top metal level10.

REFERENCES:
patent: 5883781 (1999-03-01), Yamamichi et al.
patent: 5998250 (1999-12-01), Andricacos et al.
patent: 6303953 (2001-10-01), Doan et al.
patent: 6737728 (2004-05-01), Block et al.

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