Dual-gate insulated gate field effect device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257394, 257382, 257401, H01L 2960

Patent

active

055280650

ABSTRACT:
A dual-gate insulated gate field effect device (1) such as a MOS tetrode has an active device area (3) in which adjacent source regions (5) are separated by and spaced apart from an intervening drain region (6) to define a respective conduction channel region (7) between each source and drain region (5 and 6). An insulated gate structure (10) has first insulated gate sections (11) forming an inner insulated gate (110) connected so as to surround each drain region 6 and second insulated gate sections (12) provided between the first insulated gate sections (11) and the source regions (5) and forming an outer insulated gate (120). Ends (11a,12a) of the insulated gate sections (11 and 12) extend onto the surrounding field oxide (4) to connect with respective first and gate conductors (13 and 14). Each drain region (6) is associated with an additional source region (50) spaced apart from the drain region (6) in a direction parallel to the width W of the conduction channel regions to define an additional conduction channel region. The second insulated gate sections (12) are connected to provide an area of insulated gate (12b) between each additional source region (50) and the associated drain region (6). This substantially eliminates leakage currents and enables the use of a design in which parasitic capacitances are reduced.

REFERENCES:
patent: 4635088 (1987-01-01), Eguchi
patent: 4879582 (1989-11-01), Kimura et al.
Sze, S. M., Semi conductor Devices : Physics and Technology, Bell Telephone Laboratories, Inc., 1985, pp. 422-423 and 376-377.
"A UHF MOS Tetrode With Polysilicon Gate" Solid-State Electronics, vol. 23, pp. 23-30, by F. M. Klassen, H. J. Wilting and W. C. J. de Groot; Pergamon Press Ltd. 1980.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dual-gate insulated gate field effect device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dual-gate insulated gate field effect device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual-gate insulated gate field effect device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-224804

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.