Dual discharge plasma device

Details Dual discharge plasma device Dual discharge plasma device

1979-04-26

1981-11-17

Smith, Alfred E.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511121, 31323141, H01J 724, H05B 3126

Patent

active

043013910

ABSTRACT:
The first plasma discharge chamber of the dual discharge plasma device contains an electron emitter and a first anode and contains gas at a sufficiently high pressure that the discharge voltage in the first chamber is below the sputtering threshold. The second chamber has a main anode and receives a plume of plasma from the first chamber. The main anode operates at a voltage above the sputtering threshold with a respect to the first anode and the gas in the second chamber is at a low enough pressure for a conventional low pressure plasma discharge which is used as an ion source.

REFERENCES:
patent: 3323002 (1967-05-01), Lafferty
patent: 3343027 (1967-09-01), Frohlich
patent: 3515932 (1976-06-01), King
patent: 3890535 (1975-06-01), Gautherin et al.
patent: 3924134 (1975-12-01), Uman et al.

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