Dual channel gas distribution plate

Details Dual channel gas distribution plate Dual channel gas distribution plate

1998-12-09

2000-11-21

Beck, Shrive

Coating apparatus

Gas or vapor deposition

118719, C23C 1600

Patent

active

061487619

ABSTRACT:
A multi-channel faceplate 200, that in some embodiments is monolithic, is provided as a portion of a gas delivery system to a process chamber 100. At least two sets of gas pathways are disposed through a faceplate and allow for independent delivery of separate gases into a process chamber 100. In one embodiment, a first gas pathway, which includes a first set of vertical channels 226, is formed through the faceplate 200. A second gas pathway includes a second set of vertical channels 228, which is formed through a portion of the faceplate and connected to a set of interconnecting horizontal channels 222 in the faceplate 200, where the second gas pathway maintains fluidic separation from the first gas pathway, prior to the gases entering the process chamber 100.

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patent: 5700720 (1997-12-01), Hashimoto
patent: 5792269 (1998-08-01), Deacon et al.

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