Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Parameter related to the reproduction or fidelity of a...
Patent
1995-05-16
1996-10-08
Wieder, Kenneth A.
Electricity: measuring and testing
Impedance, admittance or other quantities representative of...
Parameter related to the reproduction or fidelity of a...
324520, 324537, G01R 2926
Patent
active
055635172
ABSTRACT:
A test system having an improved physical layout and electrical design allows the 1/f noise of metal interconnects to be measured at levels close to that of Johnson or thermal noise. A detailed description of examples of operation of the test system provides evidence of the effectiveness of the test system in minimizing system noise to a level significantly lower than Johnson noise. This permits quantitative measurment of the noise contribution attributable to variations in cross-sectional area of connections for various applications and for qualitative prediction of electromigration lifetimes of metal films, particularly aluminum, having different microstructures. The test system includes an enclosure which includes several nested groups of housings including a sample oven within a device under test box which is, in turn, contained within the system enclosure. Wire wound resistors powered by a DC power supply are used to provide heating without interfering with measurement of 1/f noise of a device under test (D.U.T.). A biasing circuit and a bank of batteries are also provided with separate enclosures within the system enclosure.
REFERENCES:
patent: 3639703 (1972-02-01), Bergemann et al.
patent: 4275348 (1981-06-01), Bayer et al.
patent: 4331285 (1982-05-01), Gottwals
patent: 4483629 (1984-11-01), Schwarz et al.
patent: 4554608 (1985-11-01), Block
patent: 4570156 (1986-02-01), Nicholas, Jr.
patent: 4739258 (1988-04-01), Schwarz
patent: 4864218 (1989-09-01), Leake et al.
patent: 4899289 (1990-02-01), Appel
patent: 4949031 (1990-08-01), Szasz et al.
patent: 4978914 (1990-12-01), Akimoto et al.
patent: 4991051 (1991-02-01), Hung
patent: 4992624 (1991-02-01), Benson et al.
patent: 4998071 (1991-03-01), Strid et al.
patent: 5045637 (1991-09-01), Sato et al.
patent: 5045638 (1991-09-01), Wada et al.
patent: 5049811 (1991-09-01), Dreyer et al.
patent: 5057441 (1991-10-01), Gutt et al.
"Minimization of Low Frequency Noise Sources In Electronic Measurements"; B. Pellegrini et al.; Instituto di Electronica e Telecomunicazioni and Centro di Studio; pp. 195-200; Jun. 1986.
"Electromigration and Low-Frequency Resistance Fluctuations in Aluminum Thin-Film Interconnections"; Bruno Neri et al.; IEEE; Nov. 1987; pp. 2317-2322.
"An Automated Noise Measurement System for Packaged VLSI Metal Thin Films"; G. M. Gutt et al.; Univ. of South Florida; Apr. 1989 Southeastcon; pp. 1305-1309.
"Stress dependent low-frequency electrical noise in carbon fibers"; Dinesh Patel et al.; Journal of Applied Physics; Sept. 1992; No. 5; pp. 1901-1905.
"1/f Noise and Grain-Boundary Diffusion in Aluminum and Aluminum Alloys"; R. H. Koch et al.; Physical Review Letters; vol. 55, No. 22; Nov. 1985; The American Physical Society; pp. 2487-2490.
"Direct link between 1/f noise and defects in metal films"; D. M. Fleetwood et al.; The American Physical Society; Jan. 1985; vol. 31, No. 2; pp. 1157-1160.
"Characterization of Probe Contact Noise for Probes Used in Wafer-Level Testing"; A. M. Yassine et al.; IEEE Electron Device Letters; vol. 12, No. 5; May 1991; pp. 200-202.
Biery Glenn A.
Boyne Daniel M.
Rodbell Kenneth P.
Smith Richard G.
Wood Michael H.
Brown Glenn W.
International Business Machines - Corporation
Peterson Jr. Charles W.
Wieder Kenneth A.
LandOfFree
Dual channel d.c. low noise measurement system and test methodol does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Dual channel d.c. low noise measurement system and test methodol, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dual channel d.c. low noise measurement system and test methodol will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-60112