Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive...
Patent
1983-07-05
1984-08-28
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
430270, 430281, 430286, 430291, 430322, 430325, 430326, 430310, G03C 500
Patent
active
044684533
ABSTRACT:
The actinic radiation-exposed or unexposed areas, whichever are relatively low in abrasion resistance, formed in a photosensitive composition layer superimposed on a substrate are selectively removed by blowing an abrasive material against the layer, thereby to obtain a desired image in the layer. By utilizing an article body intended for engraving a pattern as the substrate and by further blowing an abrasive material against the article body until the article body comes to have a pattern of desired depth, a pattern-engraved article can be advantageously produced. The above processes are extremely advantageous over the prior art because any solvent is not needed for the development so that the treatment of the waste solvent and the drying step can be eliminated and because a pattern-engraved article can be produced by the dry process in which the number of necessary steps is reduced.
REFERENCES:
patent: 3677756 (1972-07-01), Protzman
patent: 4137081 (1979-01-01), Pohl
patent: 4173673 (1979-11-01), Bratt et al.
patent: 4175964 (1979-11-01), Uchida et al.
patent: 4241165 (1980-12-01), Hughes et al.
Kinoshita Nobuyasu
Nakamura Shohei
Asahi Kasei Kogyo Kabushiki Kaisha
Brammer Jack P.
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