Dry process apparatus using plural kinds of gas

Details Dry process apparatus using plural kinds of gas Dry process apparatus using plural kinds of gas

1995-05-24

1996-03-19

Bueker, Richard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427585, 4272552, 4272553, 4272557, 437238, 437241, 118715, 118723E, 118725, C23C 1600

Patent

active

055002560

ABSTRACT:
An apparatus for manufacturing a semiconductor device including: a process chamber capable of being evacuated; a wafer susceptor disposed in the process chamber, the wafer susceptor having a plane on which a wafer to be processed is placed; a plurality of gas flow paths forming a structure of a plurality of spirals, facing the table, and being disposed along a flat plane generally parallel to the plane of the susceptor; and a plurality of gas ejecting holes formed in a plane of the gas flow paths facing the susceptor, for and along each gas flow path. A plurality of processes can be performed in the same chamber.

REFERENCES:
Extended Abstracts (54th Autumn Meeting, 1993) The Japan Society of Applied Physics.

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