Dry film resists containing unsaturated oligomer

Details Dry film resists containing unsaturated oligomer Dry film resists containing unsaturated oligomer

1984-11-23

1986-05-20

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430287, 430288, 522 44, 522121, 528232, 528242, G03C 168

Patent

active

045901473

ABSTRACT:
A polymerizable composition comprises a polymerizable olefinically unsaturated aromatic/aldehyde oligomer, a polymeric binder and a photoinitiator system. Such compositions may be used to prepare permanent dry film resists.

REFERENCES:
patent: 3469982 (1969-09-01), Coleste
patent: 3914194 (1975-10-01), Smith
patent: 4439291 (1984-03-01), Irving et al.

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