Dry film resists

Details Dry film resists Dry film resists

1982-04-12

1984-01-31

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 20415918, 20415923, G03C 168

Patent

active

044290349

ABSTRACT:
A resist film composed of a water-soluble polyvinyl alcohol, a water-soluble thermosetting polymethylol cross-linking agent and a polyaryl iodonium or sulfonium salt of a complex halogenide as catalyst, when irradiated with ultraviolet light and then heated, or when heated and irradiated with ultraviolet light, under a circuit mask, provides a latent image which is developable by water alone.

REFERENCES:
patent: 4026705 (1977-05-01), Crivello et al.
patent: 4090936 (1978-05-01), Barton
patent: 4138255 (1979-02-01), Crivello
patent: 4161478 (1979-07-01), Crivello
Photoresist Materials and Processes, by W. S. DeForest (McGraw-Hill Book Co., New York, N.Y. 1975).

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