Dry film photosensitive resist

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430281, 430905, 430910, G03C 168

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active

042346754

ABSTRACT:
A dry film photosensitive resist, according to the invention, is a flexible laminated structure consisting of three layers of which the first is a transparent polymer film transmitting UV radiation and having a thickness of 5-100.mu.; the second of said layers being a light-sensitive layer having a thickness of 5-1,000.mu. and comprising a combination of a carboxyl-containing polymer-thickener, a polar oligomer, and a monomeric substance having a boiling point above 200.degree. C. at 760 mm Hg; the third of the layers being a film from a polymeric substance having a thickness of 5-100.mu., the last-mentioned layer being a protective layer for the light sensitive layer and being disposed thereon. All the three layers are adhesively bonded together. The light-sensitive layer contains as the carboxyl-containing polymer thickener, a water insoluble copolymer of a monomer or a mixture of monomers having a neutral reaction with the carboxyl-containing monomer.

REFERENCES:
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patent: 3770438 (1973-11-01), Celeste
patent: 3785817 (1974-01-01), Kuchta
patent: 3878076 (1975-04-01), Nishikubo et al.
patent: 3935330 (1976-01-01), Smith et al.
patent: 3936366 (1976-02-01), Green
patent: 3949143 (1976-04-01), Schlesinger
patent: 3992275 (1976-11-01), Shahidi et al.

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