Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1979-02-28
1980-11-18
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430281, 430905, 430910, G03C 168
Patent
active
042346754
ABSTRACT:
A dry film photosensitive resist, according to the invention, is a flexible laminated structure consisting of three layers of which the first is a transparent polymer film transmitting UV radiation and having a thickness of 5-100.mu.; the second of said layers being a light-sensitive layer having a thickness of 5-1,000.mu. and comprising a combination of a carboxyl-containing polymer-thickener, a polar oligomer, and a monomeric substance having a boiling point above 200.degree. C. at 760 mm Hg; the third of the layers being a film from a polymeric substance having a thickness of 5-100.mu., the last-mentioned layer being a protective layer for the light sensitive layer and being disposed thereon. All the three layers are adhesively bonded together. The light-sensitive layer contains as the carboxyl-containing polymer thickener, a water insoluble copolymer of a monomer or a mixture of monomers having a neutral reaction with the carboxyl-containing monomer.
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