Dry film photoresist construction suitable for rolling up on its

Details Dry film photoresist construction suitable for rolling up on its Dry film photoresist construction suitable for rolling up on its

1997-09-24

2000-05-02

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430501, G03C 176

Patent

active

060570792

ABSTRACT:
A dry film photoresist construction suitable for rolling up which includes a support layer having a top surface having thereon a thin layer of photoresist adhered thereto, and on the bottom surface a silicone release coating having greater adherence to said support layer than to said photoresist.

REFERENCES:
patent: Re28682 (1976-01-01), Hoey
patent: 3961961 (1976-06-01), Rich
patent: 4282310 (1981-08-01), Edhlund
patent: 4293635 (1981-10-01), Flint et al.
patent: 4992354 (1991-02-01), Axon et al.
patent: 5213945 (1993-05-01), Roos et al.
patent: 5229212 (1993-07-01), Reed
patent: 5326674 (1994-07-01), Toyama et al.
patent: 5424120 (1995-06-01), Culbertson
patent: 5489621 (1996-02-01), Sato et al.
patent: 5494774 (1996-02-01), Ali et al..

Affiliated with

Also associated with

Rating

Dry film photoresist construction suitable for rolling up on its does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dry film photoresist construction suitable for rolling up on its, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dry film photoresist construction suitable for rolling up on its will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1592583