Dry film photoresist

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S286100, C430S287100, C430S916000, C522S034000, C522S035000, C522S905000, C522S904000

Reexamination Certificate

active

10391051

ABSTRACT:
A dry film photoresist includes a functional polymer. The functional polymer has α,β-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.

REFERENCES:
patent: 3620733 (1971-11-01), Hartmut et al.
patent: 4040925 (1977-08-01), McGinniss
patent: 4186069 (1980-01-01), Muzyczko et al.
patent: 4224398 (1980-09-01), Muzyczko et al.
patent: 4273851 (1981-06-01), Muzyczko et al.
patent: 4537855 (1985-08-01), Ide
patent: 4795787 (1989-01-01), Walz
patent: 4910119 (1990-03-01), Schneller et al.
patent: 4912018 (1990-03-01), Osuch et al.
patent: 4992354 (1991-02-01), Axon et al.
patent: 5037913 (1991-08-01), Leussler et al.
patent: 5068262 (1991-11-01), Noguchi
patent: 5070118 (1991-12-01), Eckberg
patent: 5108870 (1992-04-01), Shalom
patent: 5153323 (1992-10-01), Rossman et al.
patent: 5376503 (1994-12-01), Audett et al.
patent: 5415972 (1995-05-01), Mayes
patent: 5492790 (1996-02-01), Hishiro
patent: 5683856 (1997-11-01), Aoai et al.
patent: 5712078 (1998-01-01), Huang et al.
patent: 5719008 (1998-02-01), Hozumi et al.
patent: 5723513 (1998-03-01), Bonham et al.
patent: 5733714 (1998-03-01), McCulloch et al.
patent: 5741829 (1998-04-01), Reich et al.
patent: 5869220 (1999-02-01), Hallock et al.
patent: 5945489 (1999-08-01), Moy et al.
patent: 6011077 (2000-01-01), Muller
patent: 6025410 (2000-02-01), Moy et al.
patent: 6151042 (2000-11-01), Smith et al.
patent: 6153349 (2000-11-01), Ichikawa et al.
patent: 6156345 (2000-12-01), Chudzik et al.
patent: 6165677 (2000-12-01), Yako
patent: 6207356 (2001-03-01), Banba et al.
patent: 6242597 (2001-06-01), Gupta et al.
patent: 6251569 (2001-06-01), Angelopoulos et al.
patent: 6294591 (2001-09-01), Blum et al.
patent: 6297328 (2001-10-01), Collins et al.
patent: 6406828 (2002-06-01), Szmanda et al.
patent: 6455479 (2002-09-01), Sahbari
patent: 6458517 (2002-10-01), Nohara et al.
patent: 2004/0013895 (2004-01-01), Dean et al.
patent: 2004/0063027 (2004-04-01), Barr et al.
patent: 0 469 584 (1997-03-01), None
patent: 1 008 911 (2000-06-01), None
patent: 1 336 630 (2003-08-01), None
patent: 1 403 708 (2004-03-01), None
patent: 1 403 709 (2004-03-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dry film photoresist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dry film photoresist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dry film photoresist will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3904552

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.