Dry film photoresist

Details Dry film photoresist Dry film photoresist

2008-01-29

2008-01-29

Schilling, Richard L. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S286100, C430S287100, C430S916000, C522S034000, C522S035000, C522S905000, C522S904000

Reexamination Certificate

active

07323290

ABSTRACT:
A dry film photoresist includes a functional polymer. The functional polymer has α,β-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.

REFERENCES:
patent: 3620733 (1971-11-01), Hartmut et al.
patent: 4040925 (1977-08-01), McGinniss
patent: 4186069 (1980-01-01), Muzyczko et al.
patent: 4224398 (1980-09-01), Muzyczko et al.
patent: 4273851 (1981-06-01), Muzyczko et al.
patent: 4537855 (1985-08-01), Ide
patent: 4795787 (1989-01-01), Walz
patent: 4910119 (1990-03-01), Schneller et al.
patent: 4912018 (1990-03-01), Osuch et al.
patent: 4992354 (1991-02-01), Axon et al.
patent: 5037913 (1991-08-01), Leussler et al.
patent: 5068262 (1991-11-01), Noguchi
patent: 5070118 (1991-12-01), Eckberg
patent: 5108870 (1992-04-01), Shalom
patent: 5153323 (1992-10-01), Rossman et al.
patent: 5376503 (1994-12-01), Audett et al.
patent: 5415972 (1995-05-01), Mayes
patent: 5492790 (1996-02-01), Hishiro
patent: 5683856 (1997-11-01), Aoai et al.
patent: 5712078 (1998-01-01), Huang et al.
patent: 5719008 (1998-02-01), Hozumi et al.
patent: 5723513 (1998-03-01), Bonham et al.
patent: 5733714 (1998-03-01), McCulloch et al.
patent: 5741829 (1998-04-01), Reich et al.
patent: 5869220 (1999-02-01), Hallock et al.
patent: 5945489 (1999-08-01), Moy et al.
patent: 6011077 (2000-01-01), Muller
patent: 6025410 (2000-02-01), Moy et al.
patent: 6151042 (2000-11-01), Smith et al.
patent: 6153349 (2000-11-01), Ichikawa et al.
patent: 6156345 (2000-12-01), Chudzik et al.
patent: 6165677 (2000-12-01), Yako
patent: 6207356 (2001-03-01), Banba et al.
patent: 6242597 (2001-06-01), Gupta et al.
patent: 6251569 (2001-06-01), Angelopoulos et al.
patent: 6294591 (2001-09-01), Blum et al.
patent: 6297328 (2001-10-01), Collins et al.
patent: 6406828 (2002-06-01), Szmanda et al.
patent: 6455479 (2002-09-01), Sahbari
patent: 6458517 (2002-10-01), Nohara et al.
patent: 2004/0013895 (2004-01-01), Dean et al.
patent: 2004/0063027 (2004-04-01), Barr et al.
patent: 0 469 584 (1997-03-01), None
patent: 1 008 911 (2000-06-01), None
patent: 1 336 630 (2003-08-01), None
patent: 1 403 708 (2004-03-01), None
patent: 1 403 709 (2004-03-01), None

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