Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-02-13
1991-09-03
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430910, 522 15, 522 30, G03C 176
Patent
active
050454315
ABSTRACT:
A new polymer family is shown for use in high speed photoresists. A dry film photoresist includes a polymer binder prepared from t-butyl methacrylate/methylmethacrylate/acrylic acid/ethyl acrylate and a suitable initiator.
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Allen Robert D.
Hinsberg, III William D.
Simpson Logan L.
Wallraff Gregory M.
Brammer Jack P.
Gunter Jr. Charles D.
International Business Machines - Corporation
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