Dry-etching process

Details Dry-etching process Dry-etching process

1984-10-04

1986-04-08

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

134 1, 156646, 156656, 156657, 1566591, 156662, 156664, 156665, 204192E, 252 791, 427 38, H01L 21306, B44C 122, C03C 1500, C23F 100

Patent

active

045811016

ABSTRACT:
A dry-etching process comprising dry-etching treatment of semiconductor material by action of a gas and, if necessary, cleaning treatment, characterized in that at least one of the dry-etching and cleaning treatments is conducted under action of a gas composed essentially of a fluorinated ether.

REFERENCES:
patent: 4260649 (1981-04-01), Dension
patent: 4308089 (1981-12-01), Iida et al.
patent: 4372807 (1983-02-01), Vossen et al.

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