Dry etching process

Details Dry etching process Dry etching process

1985-04-26

1987-01-06

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156651, 156657, 1566591, 156662, 156667, 156904, 20419232, 427 431, 430313, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

046344950

ABSTRACT:
In a dry etching process for patterning a substrate (2), an etching mask (4) consisting of a chemically deposited oxide, for example Al.sub.2 O.sub.3, is used and the etching is carried out in a fluorine-containing plasma. By this means, etching selectivities of more than 100 are achieved for a substrate (2) of silicon.

REFERENCES:
patent: 4132586 (1979-01-01), Schaible et al.
patent: 4288283 (1981-09-01), Umezaki et al.
patent: 4502916 (1985-03-01), Umezaki et al.

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