Dry etching method and method for prevention of low temperature

Details Dry etching method and method for prevention of low temperature Dry etching method and method for prevention of low temperature

1990-07-18

1991-02-12

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156657, 1566591, 156662, 20419237, B44C 122, C03C 1500, C03C 2506

Patent

active

049921371

ABSTRACT:
A method of preventing low temperature dry etch deposit on a semiconductor substrate wafer comprises:

REFERENCES:
patent: 4784719 (1988-11-01), Schutz
patent: 4948462 (1990-08-01), Rossen

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