Dry-etching method and apparatus therefor

Details Dry-etching method and apparatus therefor Dry-etching method and apparatus therefor

1985-09-11

1987-05-26

Cintins, Ivars

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156345, H01L 21306

Patent

active

046683372

ABSTRACT:
A dry-etching method for performing anisotropic etching on a semiconductor substrate by employing an etching gas together with a film-forming gas while irradiating light or an X-ray on the semiconductor substrate. In this method at least one of the etching gas or film-forming gas is excited in a separated chamber before being introduced into an etching chamber. A dry-etching apparatus for performing the above dry-etching method is also proposed.

REFERENCES:
patent: 4123663 (1978-10-01), Horiike
patent: 4183780 (1980-01-01), McKenna et al.
patent: 4529475 (1985-07-01), Okano et al.

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