Dry-etching method

Details Dry-etching method Dry-etching method

1989-10-16

1991-06-18

Schor, Kenneth M.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156652, 156656, 156665, 156628, C23F 102, C23F 402

Patent

active

050247247

ABSTRACT:
The present invention relates to a novel dry-etching method for patterning a metallic film, whose surface is provided with an oxidized film, into an optional configuration by the use of the oxidized film. After drawing etching patterns of the metallic film by irradiating energy beam to the oxidized film formed on the surface of the metallic film, the dry-etching method according to the present invention causes the metallic film to expose itself to either radicals of reactive gas or to etching gas, and then selectively removes the area of metallic film in correspondence to the beam irradiated area of the oxidized film by applying chemical etching, thus eventually allowing the metallic film to be patterned into an optional configuration, without incuring physical damage to the etching face of the metallic film.

REFERENCES:
patent: 4390394 (1983-06-01), Mathuni et al.
patent: 4412885 (1983-11-01), Wang et al.
patent: 4474642 (1984-10-01), Nakane et al.
patent: 4490210 (1984-12-01), Chen et al.
patent: 4505782 (1985-03-01), Jacob et al.
patent: 4529475 (1985-07-01), Okano et al.
patent: 4618398 (1986-10-01), Nawata et al.
patent: 4622095 (1986-11-01), Grobman et al.
patent: 4834834 (1989-05-01), Ehrlich et al.

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