Dry etching device

Details Dry etching device Dry etching device

1997-09-11

1999-09-28

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Work support

118729, 118723MA, 118723MR, 156345, C23C 1600

Patent

active

059581417

ABSTRACT:
The dry etching device according to the present invention comprises a vacuum chamber connected to a vacuum source, a gas supply unit including a gas supply source and a number of gas supply pipes for leading a gas from the gas supply source to an inside of the vacuum chamber, and a number of electrical discharge electrodes, respectively arranged inside the vacuum chamber, for changing the gas led to the inside of the vacuum chamber into a plasma, active ions or both of the plasma and the active ions, wherein the electrical discharge electrode has a number of circular or polygonal ring shaped permanent magnets detachably interfitted into a shaft at regular intervals via each insulator in a magnetizing direction of the each permanent magnet, and aligned so that each magnet pole of the permanent magnets adjacent to each other may be equal to that of the adjacent permanent magnet.

REFERENCES:
patent: 5374313 (1994-12-01), Doehler
patent: 5378284 (1995-01-01), Geisler et al.

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