Dry-etching apparatus

Details Dry-etching apparatus Dry-etching apparatus

1988-08-04

1990-03-06

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419232, 156345, 156643, C23F 400

Patent

active

049063472

ABSTRACT:
The magnetron dry-etching apparatus has, behind its anode electrode (1) facing an object to be etched positioned on a cathode electrode (2), a rotatable magnet assembly comprising at least one pair of rotatable permanent magnets (12) of narrow-pie-shape, fixed on a common yoke (14) so that different polarity magnetic poles (N and S) are disposed side by side; whereby a uniform magnetic field is formed on a wafer (8) on the cathode (2) upon rotation of said magnet assembly, thereby assuring uniform etching even upon change of gas pressure of other etching conditions.

REFERENCES:
patent: 4631106 (1986-12-01), Nakazato et al.

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