Dry-developing resist composition

Details Dry-developing resist composition Dry-developing resist composition

1982-06-07

1984-11-06

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430271, 430286, 430296, 430326, 430323, 20415913, G03C 172, G03F 726

Patent

active

044812795

ABSTRACT:
A dry-developing positive resist composition consisting of (a) a polymeric material containing, in the molecular structure, unsaturated hydrocarbon bonds inclusive of vinyl, allyl, cinnamoyl, or acryl double bonds or epoxy groups or halogen atoms and (b) 1% to 70% by weight, based on the weight of the composition, of a silicon compound. A positive resist pattern is formed on a substrate by a process comprising coating the substrate with said resist composition, exposing the resist layer to radiation, and developing a resist pattern on the substrate by treatment with gas plasma.

REFERENCES:
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patent: 4048357 (1977-09-01), Van Paesschen et al.
patent: 4092442 (1978-05-01), Agnihotri et al.
patent: 4143013 (1979-03-01), Jenkinson et al.
patent: 4232110 (1980-11-01), Taylor
Gessner G. Hawley, (ed.), The Condensed Chemical Dictionary, (Eighth Edition), (Van Nostrand Reinhold Company, 1971), p. 912.

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