Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1982-06-07
1984-08-07
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415913, 430296, 430325, 430942, 430271, G03C 516
Patent
active
044644558
ABSTRACT:
A dry-developing negative resist composition consisting of (a) a polymer of a monomer of the following formula I or II or a copolymer of a monomer of the following formula I with a monomer of the following formula II, ##STR1## in which R represents alkyl of 1 to 6 carbon atoms, benzyl, phenyl, or cyclohexyl and (b) 1% to 70% by weight, based on the weight of the composition, of a silicone compound. A negative resist pattern can be formed on a substrate by a process comprising coating the substrate with the resist composition, exposing the resist layer to an ionizing radiation, subjecting the resist layer to a relief treatment, and developing a resist pattern on the substrate by treatment with gas plasma.
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K. Nate and T. Kobayashi, "Poly p-Substituted Phenyl Isopropyl Ketones for Positive Photoresists", Journal of the Electrochemical Society, (USA), vol. 128, No. 6, Jun. 1981, pp. 1394-1395.
Kitakohji Toshisuke
Kitamura Kenroh
Naito Jiro
Yoneda Yasuhiro
Fujitsu Limited
Hamilton Cynthia
Kittle John E.
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