Dry developable positive photoresists

Details Dry developable positive photoresists Dry developable positive photoresists

1982-11-15

1984-02-21

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430270, 430313, 430323, 430326, 430327, 156643, 526279, G03F 726, G03C 176, C08F 3008

Patent

active

044330448

ABSTRACT:
Novel copolymers comprising a compound containing an acrylate moiety and a silicon-containing oxime ester of methacrylic acid having the formula ##STR1## are positive resist recording media which can be dry developed.

REFERENCES:
patent: 3558311 (1971-01-01), Delzenne et al.
Petrov et al., in Dokl. Akad. Nauk. S.S.S.R. 100, pp. 929-932 (1955) Chemical Abstract.
Taylor et al., J. Electrochem. Soc., 127, No. 12, pp. 2665-2674 (1980).
Taylor et al., J. Electrochem. Soc., 128, No. 2, pp. 361-366 (1981).
Hughes et al., Polymer Eng. & Sci., 20, No. 16, pp. 1093-1096 (1980).
Yoshikawa et al., Appl. Phys. Lett., 36, No. 1, pp. 107-109 (1980).
Chang et al., Appl. Phys. Lett., 33, No. 10, pp. 892-895 (1978).

Affiliated with

Also associated with

Rating

Dry developable positive photoresists does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dry developable positive photoresists, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dry developable positive photoresists will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1035932