Dry cleaner for wafer carriers

Details Dry cleaner for wafer carriers Dry cleaner for wafer carriers

1996-12-30

1999-04-27

Bennett, Henry

Drying and gas or vapor contact with solids

Process

Gas or vapor contact with treated material

34218, 15303, F26B 300

Patent

active

058966749

ABSTRACT:
A dry cleaner easily and rapidly eliminates particles and dirt adhered to interior surfaces of the wafer carrier. The dry cleaner has a housing with a table mounted thereon, and an assembly for cleaning the wafer carriers disposed on the table. The cleaning assembly sprays a cleaning gas simultaneously into the carrier box and the cover of the wafer carrier. Dirt and particles separated from the carrier box and the cover are collected, by vacuum pressure through openings in the table, into a dirt-collector disposed in the housing, and then discharged through an exhaust tube. A controller controls a quantity of cleaning gas supplied and a time of cleaning by the cleaning assembly.

REFERENCES:
patent: 2257836 (1941-10-01), Brown
patent: 5238503 (1993-08-01), Phenix et al.

Affiliated with

Also associated with

Rating

Dry cleaner for wafer carriers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dry cleaner for wafer carriers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dry cleaner for wafer carriers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-676515