Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Reexamination Certificate
2004-12-13
2008-05-20
Lebentritt, Michael (Department: 2812)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
C438S149000, C438S584000, C430S324000, C427S096100, C257SE21166
Reexamination Certificate
active
07374977
ABSTRACT:
It is an object of the present invention to improve the usability of a material, and to provide a display device which can be manufactured by simplifying the manufacturing process and a manufacturing technique thereof. It is also an object of the invention to provide a technique in which a pattern of a wiring or the like constituting these display devices can be formed to have a desired shape with favorable controllability. One feature of a droplet discharge device of the invention comprises: a discharge means for discharging a composition including a pattern forming material; and a shape means for shaping the shape of the composition before the composition is attached to a formation region, in which the shape means is provided between the discharge means and the formation region.
REFERENCES:
patent: 6872672 (2005-03-01), Yamazaki et al.
patent: 7061570 (2006-06-01), Imai
patent: 2003/0008429 (2003-01-01), Yamazaki et al.
patent: 2003/0083203 (2003-05-01), Hashimoto et al.
patent: 2004/0070651 (2004-04-01), Usui et al.
patent: 2004/0263564 (2004-12-01), Maekawa et al.
patent: 2006/0180826 (2006-08-01), Yamazaki et al.
patent: 2007/0132377 (2007-06-01), Yamazaki et al.
patent: 11-207959 (1999-08-01), None
patent: 11-251259 (1999-09-01), None
patent: 11251259 (1999-09-01), None
patent: 2003-133691 (2003-05-01), None
patent: 2003-273092 (2003-09-01), None
patent: 2003-273097 (2003-09-01), None
Imai Keitaro
Yamazaki Shunpei
Ahmadi Mohsen
Cook Alex McFarron Manzo Cummings & Mehler, Ltd.
Lebentritt Michael
Semiconductor Energy Laboratory Co,. Ltd.
LandOfFree
Droplet discharge device, and method for forming pattern,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Droplet discharge device, and method for forming pattern,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Droplet discharge device, and method for forming pattern,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3985188