Driving mechanism with gas bearing

Motors: expansible chamber type – With motive fluid valve – Responsive to motor position or orientation

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Details

92153, 92DIG2, 384 12, F15B 1108, F01B 3110, F16C 3206

Patent

active

052188965

ABSTRACT:
A driving mechanism usable in an electron beam exposure apparatus, X-ray exposure apparatus, ion beam exposure apparatus, evaporation apparatus, chemical vapor deposition apparatus or otherwise, for rectilinearly moving a wafer carrying stage in a vacuum chamber is disclosed. The mechanism includes a guide shaft, a partition flange fixed to the guide shaft, a pair of bearing assemblies slidably mounted to the guide shaft and disposed on the opposite sides of the flange, a coupling barrel for coupling the paired bearing assemblies and covering the guide shaft portion between the bearing assemblies, and a fluid supplying system for supplying fluids to the opposite sides of the partition flange. With this structure, the stage can be moved rectilinearly by controlling the fluid pressures on the opposite sides of the flange, while retaining high vacuum in the vacuum chamber.

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