Drawing apparatus and drawing method

Details Drawing apparatus and drawing method Drawing apparatus and drawing method

2007-09-04

2007-09-04

Whitmore, Stacy A (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C250S492200, C250S492220, C700S121000, C430S030000, C430S311000

Reexamination Certificate

active

11191021

ABSTRACT:
A drawing apparatus, for forming a desired drawing pattern by drawing the pattern directly on a drawing target surface using a drawing engine equipped with a plurality of drawing devices arranged along a direction of relative movement of the drawing target surface, the drawing engine being designed so that the design spacing of the thus arranged drawing devices is equal to a product of a unit pixel spacing in drawing data and an integer, comprises: correcting means for generating corrected drawing data by correcting the drawing data based on the difference between the design spacing and the actual spacing of the drawing devices; and supplying means for supplying the drawing engine with the corrected drawing data just necessary for direct drawing to a drawing block that the drawing engine can draw at a time on the drawing target surface, each time the drawing target substrate moves in relative fashion by a distance corresponding to an actual pixel spacing that is obtained by dividing the actual spacing of the drawing devices by that integer.

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patent: 2004/0239908 (2004-12-01), Bleeker et al.
patent: 2006/0121395 (2006-06-01), Fries
patent: 10-112579 (1998-04-01), None

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