DRAMS constructions and DRAM devices

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S336000, C257S905000

Reexamination Certificate

active

07105881

ABSTRACT:
The invention includes a DRAM device. The device has an access transistor construction, and the access transistor construction has a pair of source/drain regions. A halo region is associated with one of the source/drain regions of the access transistor construction and no comparable halo region is associated with the other of the source/drain regions of the access transistor construction. The invention also encompasses methods of forming DRAM devices.

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patent: 6331725 (2001-12-01), Dennison
patent: 6380045 (2002-04-01), Guo
patent: 6468876 (2002-10-01), Ukita et al.
patent: 6545904 (2003-04-01), Tran
patent: 6576965 (2003-06-01), Eikyu et al.

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