Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2011-05-24
2011-05-24
Richards, N Drew (Department: 2895)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257SE29260, C257S396000, C257S288000, C257S331000, C257S332000, C257S520000, C257S559000
Reexamination Certificate
active
07948028
ABSTRACT:
A transistor device employed in a support circuit of a DRAM includes a semiconductor substrate having thereon a gate trench, a recessed gate embedded in the gate trench, a source doping region disposed at one side of the recessed gate, a drain doping region disposed at the other side of the recessed gate, and a gate dielectric layer between the recessed gate and the semiconductor substrate. The gate dielectric layer has at least two thicknesses that render the high-voltage transistor device asymmetric. The thicker gate dielectric layer is between the recessed gate and the drain doping region, while the thinner gate dielectric layer is between the recessed gate and the source doping region.
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Hsu Winston
Lee Jae
Margo Scott
Nanya Technology Corp.
Richards N Drew
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