Downward mechanism for support pins

Coating apparatus – Gas or vapor deposition – Work support

Reexamination Certificate

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Details

C156S345230, C414S935000, C414S936000, C414S941000

Reexamination Certificate

active

10824433

ABSTRACT:
A downward mechanism for support pins is applicable to a reactor of removable type. Support pins are located on the base of the reactor, and each support pin has a base thereunder. The downward mechanism has an elevator mechanism and a board fixed thereto. The board has several holes for the pin and the base to pass respectively therethrough. Each hole elongates into a slit allowing each of the support pins, only, to pass respectively therethrough.

REFERENCES:
patent: 6104002 (2000-08-01), Hirose et al.
patent: 6435798 (2002-08-01), Satoh
patent: 6683378 (2004-01-01), Wing et al.
patent: 7014415 (2006-03-01), Yoshizawa
patent: 2004/0219006 (2004-11-01), Tran et al.

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