Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate
2007-07-31
2007-07-31
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
Work support
C156S345230, C414S935000, C414S936000, C414S941000
Reexamination Certificate
active
10824433
ABSTRACT:
A downward mechanism for support pins is applicable to a reactor of removable type. Support pins are located on the base of the reactor, and each support pin has a base thereunder. The downward mechanism has an elevator mechanism and a board fixed thereto. The board has several holes for the pin and the base to pass respectively therethrough. Each hole elongates into a slit allowing each of the support pins, only, to pass respectively therethrough.
REFERENCES:
patent: 6104002 (2000-08-01), Hirose et al.
patent: 6435798 (2002-08-01), Satoh
patent: 6683378 (2004-01-01), Wing et al.
patent: 7014415 (2006-03-01), Yoshizawa
patent: 2004/0219006 (2004-11-01), Tran et al.
Chang Hsi-Ming
Wong Ching-Hong
Chunghwa Picture Tubes, Ltd
Hassanzadeh Parviz
Hoffman Wasson & Gitler PC
MacArthur Sylvia
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